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Compact Laser MBE


Compact Laser MBE

Our design priority, easy-to-use, brings better controllability of film growth condition

This system is designed to deposit thin films on a substrate by the laser abrasion of target materials in an ultrahigh vacuum(UHV). The apparatus consists of a deposition chamber,an infra-red heating lamp, a target revolution mechanism,and a RHEED chamber. All of them are UHV compatible. An Infra-red lamp heating that featured our appatatus can bring a substrate temperature more than 800 and afford to deposit even in a high oxygen partial pressure of higher than 500 mTorr. Standard equipped load-lock transfar mechanism enable to keep deposition environment clean and bring easy-to-use.


  • High scalability Laser MBE (PLD) system
  • An ultimate vacuum pressure of 5×10-9Torr
  • Advanced substrate heating units : halogen lamp type for up to 2 inch substrate, and laser diode type for heating to more than 1,000 degrees C
  • Up to 6 targets loadable
  • Load-Lock transfer component for easy exchange of targets and substrates
  • Various components mountable option ports
  • Fully computer control and/or electronic manual control
Compact Laser MBE


Deposition Chamber
Chamber size: φ300mm × H500mm Cylindrical horizontal
Ultimate vacuum pressure: 5×10-9Torr
Main vaccum pump: Magnetic bearing type TMP 800L/s
Multi-target manipulator
Targets number: 1inch × 6ea.
Motor driven rotation and revolution mechanism
Substrate heating unit
Selectable Substrate heating method either Halogen lamp type or Laser diode type
Halogen lamp type
  • Substrate size: up to 2inch (1.5inch standard)
  • Substrate heating: more than 800 deg C
Laser diode type
  • Substrate size: up to 10mm square
  • Substrate heating: more than 1,000 deg C
Combinatorial mask positioning unit None (option)
RHEED None (option)
Load-Lock (L/L) chamber with transfer mechanism
Chamber size: φ160mm × H240mm Cylindrical horizontal
Magnetically coupled type transfar rod
Stock number: 2 substrates, 4 targets
Common System Selectable LMBE control method either/both PC control or/and Electronic manual control


November, 2012
Pascal Co., Ltd. builds the Ibaraki Factory at Naka-city Ibaraki Japan.
September, 2010
Pascal Co., Ltd. introduces TOFLAS-3000; the New Surface Analysis Solution using Atom Scattering Spectroscopy.
April, 2008
Pascal Co., Ltd. starts to produce Cryo Cooler Series for optical, electrical or hall effect measurements.
Febrary, 2008
Pascal Co., Ltd. builds the New Head Office and moves there
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